Postdoc in First Principles Simulations of Charged Domain Walls in Ferroelectrics

Monday 04 Nov 19

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One postdoc position is available at the section for Computational Atomic-scale Materials Design (CAMD), Department of physics, Technical University of Denmark (DTU). The main focus of CAMD is first principles simulations of materials properties in the framework of Density Functional Theory. Research activities in the section include magnetism, ferroelectrics, spin-orbit physics, optical properties, two-dimensional materials, high throughput materials discovery, and machine learning.

The present project will focus on the stability and fundamental properties of charged domain walls in ferroelectric materials. In particular we will study the interplay with charged defects and shed light on the microscopic mechanisms that are responsible for the formation and stabilization of charged domain walls. The project will be carried out in close collaboration with an experimental group at DTU studying ferroelectrics with X-ray scattering.

Responsibilities and tasks
The successful candidate will be responsible for developing a first principles framework for understanding the fundamental properties of charged domain walls in ferroelectrics. Some of the fundamental questions we would like to answer are: 

  • Do charged defects act as seeds for the formation of charged domain walls in ferroelectrics?
  • Why are ferroelectric domains not depolarized under the large fields arising from charged domain walls?
  • What is the role played by domain walls in photoferroics?
  • Can photoferroic properties be optimized by domain wall design?
The topic is challenging, but offers a unique chance to delve deep into the modern theory of polarization as well as first principles treatment of defects. Moreover, we will study the properties of the inherent two-dimensional metallic states arising at charged domain walls. The candidate will work in a group consisting of four faculty members and 20 PhD students and postdocs; all dedicated to research involving first principles simulations.

Qualifications
Candidates should have a PhD in physics, materials science or a similar degree and a strong background in first principles simulations. Knowledge of ferroelectrics will be an advantage, but is not required. In addition, the candidate must have excellent communications skills in English.

Assessment
The assessment of the applicants will be made by Prof. Thomas Olsen and will be based on CV, publication record, the cover letter, and references. 

We offer
DTU is a leading technical university globally recognized for the excellence of its research, education, innovation and scientific advice. We offer a rewarding and challenging job in an international environment. We strive for academic excellence in an environment characterized by collegial respect and academic freedom tempered by responsibility. The university is located in close proximity to the beautiful city of Copenhagen

Salary and appointment terms
The appointment will be based on the collective agreement with the Danish Confederation of Professional Associations. The salary is approximately 50,000 euro a year. The period of employment is 2 years. 

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Further information
Further information may be obtained from Thomas Olsen, email: tolsen@fysik.dtu.dk.

You can read more about the department of Physics and the section for Computational Atomic-scale Materials Design (CAMD) at
www.camd.dtu.dk

Application
Please submit your online application no later than 15 December 2019 (local time)Applications must be submitted as one PDF file containing all materials to be given consideration. To apply, please open the link "Apply online", fill out the online application form, and attach all your materials in English in one PDF file. The file must include: 
  • A letter motivating the application (cover letter)
  • Curriculum vitae
  • List of publications
  • Diploma (MSc/PhD)
Applications and enclosures received after the deadline will not be considered.

All interested candidates irrespective of age, gender, race, disability, religion or ethnic background are encouraged to apply.

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